Tantalum
| Name | Tantalum |
| Tantalum Metal Powder | |
| Ta | 99.95%min |
| O | 900ppm.max |
| Size | 3–5um, or 5–8um |
Tantalum Powder Specification
Ta>99.95%, O<900ppm, H<10ppm, C<30ppm, N<25ppm, Si<15ppm, Ti<10ppm,
Mo<8ppm, W<20ppm, Mn<5ppm, Ni<15ppm, Fe<15ppm, Mg<10ppm, Cr<15ppm, Nb<40ppm.
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Frequently Asked Questions
Application fields of tantalum
Tantalum has excellent properties such as a high melting point, low vapour pressure, good cold working performance, high chemical stability, strong resistance to liquid metal corrosion, and high dielectric constant of the surface oxide film. Therefore, tantalum has important applications in high-tech fields such as electronics, metallurgy, steel, the chemical industry, cemented carbide, atomic energy, superconducting technology, automotive electronics, aerospace, medical and health care, and scientific research.